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Recently, the "Beijing Key Laboratory of Semiconductor Deep Ultraviolet Laser Source Technology," jointly applied for by Beihang University, Beijing BOPIXEL Technology Co., Ltd. ("BOPIXEL"), and the Technical Institute of Physics and Chemistry of the Chinese Academy of Sciences, was officially approved by the Beijing Municipal Science & Technology Commission and the Administrative Committee of Zhongguancun Science Park. The establishment of this laboratory signifies the Beijing municipal government's strong recognition of the joint team's R&D capabilities and innovation potential in cutting-edge deep ultraviolet (DUV) technologies, particularly at the 266 nm and 193 nm wavelengths. It also represents a significant milestone in the industry-university-research collaborative effort to tackle critical core technologies.
DUV light sources, especially at 266 nm and 193 nm, are fundamental to semiconductor manufacturing, serving as the core technological backbone for wafer defect inspection and photomask inspection. BOPIXEL, as a globally recognized leader in high-end optical imaging components, will take on the primary responsibility for the industrialization development of DUV lasers, driving the translation of laboratory breakthroughs into commercial applications.
The laboratory will fully leverage the complementary strengths of the three partners: Beihang University's theoretical foundation in optoelectronic materials and device design, the Technical Institute of Physics and Chemistry's cutting-edge expertise in deep ultraviolet nonlinear crystals, and BOPIXEL's proven industrial capabilities in DUV laser frequency multiplication, productization, and market deployment. The laboratory will focus on overcoming critical industrial bottlenecks, including power scaling, beam quality control, and long-term operational stability of all-solid-state DUV lasers, bridging the gap between laboratory prototypes and commercially viable products.
Looking ahead, the laboratory aims to accelerate the large-scale adoption of 266 nm and 193 nm DUV lasers in high-end manufacturing applications such as front-end wafer defect inspection equipment and photomask inspection tools. By delivering stable and reliable DUV light source solutions, this initiative will bolster the self-sufficiency of China's semiconductor equipment industry and reinforce the security of its supply chain. This collaboration will further strengthen BOPIXEL's competitive edge in DUV industrialization and expedite the domestic replacement of high-end semiconductor inspection equipment.
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